+
  • 气相清洗设备(1).jpg

Gas phase cleaning machine

Device characteristics

1.to enhance the adhesion of the product surface, and be contribute to facilitate the next process.
2.None waste liquid discharge during the gas phase cleaning process.
3.Can be used for cleaning metal, semiconductor, oxide and most polymer materials,etc.
4.Combined with the characteristics of protecting environment cleaning and gas cleaning, the surface micro particles can be completely removed.

0

全部
  • 全部
  • 产品管理
  • 新闻资讯
  • 介绍内容
  • 企业网点
  • 常见问题
  • 企业视频
  • 企业图册